专利名称：Deposition apparatus发明人：Sang-Jin Jeong申请号：US13948245申请日：20130723公开号：US09120114B2公开日：20150901
专利附图：
摘要：A deposition apparatus includes a substrate supporting pin that is fixed to asupporting plate through an autoalignment control unit to prevent the substratesupporting pin from being broken when loading or unloading a substrate, therebypreventing damaging the substrate and also preventing decreased yield that may result
due to the breakage of the substrate supporting pin.
申请人：ASM IP Holding B.V.
地址：Almere NL
国籍：NL
代理机构：LEX IP Meister, PLLC
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