Method and system for reducing charging artifacts

专利名称：Method and system for reducing charging

artifacts in scanning electron microscopyimages

发明人：Christopher Sears,Ben Clarke申请号：US15058062申请日：20160301公开号：US09653257B2公开日：20170516

专利附图：

摘要：A scanning electron microscopy system for mitigating charging artifacts

includes a scanning electron microscopy sub-system for acquiring multiple images from a

sample. The images include one or more sets of complementary images. The one ormore sets of complementary images include a first image acquired along a first scandirection and a second image acquired along a second scan direction opposite to the firstscan direction. The system includes a controller communicatively coupled to the scanningelectron microscopy sub-system. The controller is configured to receive images of thesample from the scanning electron microscopy sub-system. The controller is furtherconfigured to generate a composite image by combining the one or more sets ofcomplementary images.

申请人：KLA-Tencor Corporation

地址：Milpitas CA US

国籍：US

代理机构：Suiter Swantz pc llo

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