Method for creating inductive write head with stee

专利名称：Method for creating inductive write head

with steep shoulder at notch

发明人：Edward Hin Pong Lee,Aron Pentek,Wen-Chien David Hsiao

申请号：US10632631申请日：20030731

公开号：US20050023243A1公开日：20050203

专利附图：

摘要：A method for fabricating a magnetic head using a modified Pcap process. A firstpole is formed. A cap is formed above the first pole. A gap layer is formed above the cap.

A second pole is formed above the gap layer. Exposed portions of the gap layer areremoved. The cap and first pole are milled for creating a shoulder of the first poletapered upwardly towards the cap. Another method for fabricating a magnetic headincludes forming a first pole, forming a gap layer above the first pole, forming a secondpole above the gap layer, forming a layer of photoresist above the second pole,patterning the photoresist such that the photoresist covers areas of the gap layerpositioned towards the second pole, removing exposed portions of the gap layer,removing part of exposed portions of the first pole for forming steps in the first pole onopposite sides of the photoresist, removing the photoresist, and milling for creating ashoulder of the first pole tapering upwardly towards the cap.

申请人：Edward Hin Pong Lee,Aron Pentek,Wen-Chien David Hsiao

地址：San Jose CA US,San Jose CA US,San Jose CA US

国籍：US,US,US

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