Apparatus and method for control, pumping and abat

专利名称：Apparatus and method for control, pumping

and abatement for vacuum processchambers

发明人：Christopher M. Bailey,Michael S. Boger申请号：US10750309申请日：20031231

公开号：US20050147509A1公开日：20050707

专利附图：

摘要：The present invention is an apparatus and method for controlling pressure,pumping a vacuum and providing abatement for a plurality of vacuum processing

chambers. The system may be used in semiconductor manufacture. Multiple vacuumprocessing chambers are exhausted by turbo pumps into a common abatement chamber,which is maintained at sub-atmospheric pressure by a backing pump. Pressure in theprocessing chambers is independently controlled. The internal volume of the abatementdevice provides a buffer that reduces the effect of pressure changes in one processingchamber affecting pressure in the other chambers.

申请人：Christopher M. Bailey,Michael S. Boger

地址：Pleasanton CA US,Palo Alto CA US

国籍：US,US

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