专利名称：Projection lens unit with focus and level
control, related exposure apparatus andmethod
发明人：Jang-hyun Yun申请号：US11216176申请日：20050901公开号：US07535551B2公开日：20090519
专利附图：
摘要：A projection lens unit, related exposure apparatus and control method aredescribed in which measurement light irradiating a semiconductor substrate after passing
through lenses in the projection lens unit and reference light irradiating the
semiconductor substrate without passing through the lenses in the projection lens unitare used to derive a control signal adapted to adjust the position of the semiconductorsubstrate under the projection lens unit.
申请人：Jang-hyun Yun
地址：Hwaseong-si KR
国籍：KR
代理机构：Volentine & Whitt, PLLC
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